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09- Synthesis and
Characterization of novel dual-functional epoxy resin containing
photosensitive group in the main chain
P.S.Balakrishnan and S. C. Murugavel *
Polymer Research Laboratory, Department of Chemistry, PSG College of
Technology,
Coimbatore,
Tamil Nadu, India
*Corresponding
Author, e-mail:
mvelpsg@yahoo.com,
psgmvel@yahoo.co.in
Abstract:
A
novel dual functional photosensitive epoxy resin was synthesized by
solution polycondensation of
3-(4-hydroxy-3-methoxyphenyl)-1-(4-hydroxyphenyl) propenone
with epichlorohydrin. The synthesized epoxy resin was characterized
systematically by UV, FT-IR,1H-NMR and 13C-NMR
spectroscopic techniques. The thermal properties of the epoxy resin
were studied by TGA and DSC under nitrogen atmosphere. The
photosensitive property of the epoxy resin in film and solution state
was investigated by ultraviolet spectroscopy. The effects of solvents,
temperature, photo initiator and epoxy content on photosensitivity of
the epoxy resin were also studied. The dual functionality of the photo
polymer was confirmed by IR spectroscopy. The central purpose of the
present study is to lay the basis for subsequent studies of this
polymer in the development of negative photoresists.
Keywords:
Negative photoresist, Photosensitive polymers, UV sensitive groups,
Photopolymerisation, Photocrosslinking.
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